OFAC SDNCriticalEntity
FUTECH CO LTD
🇨🇳ChinaCovered Nation54325
Risk Summary
List severityHighOn 3 critical lists
Country riskHighChina (covered nation)
Ownership transparencyHighNot in global LEI registry — opacity flag
Parent exposureMediumNo parent data
Cross-list countHigh5 federal lists
Relationships at a glance
6 nodes · 5 relationships · open Network tab for full viewFederal-list cross-reference
This entity name appears on 5 federal lists.
Relationship graph
6 nodes · 5 relationshipsClick any node to open its source. Federal lists at top, primary entity in center, parents and curated profile below.
Also known as
BEIJING ZHENGYUXING TECHNOLOGY CO LTD
Known addresses
- 1502, Floor 12, Building 9, No 88 Courtyard, Jianguo Road, Chaoyang District, Beijing 100000, China
Sanctions programs / authorities
NPWMD] [IFSR
Sanctioning authority notes
Data sources
Raw record (for audit / legal review)
{
"source_list": "OFAC_SDN",
"source_record_id": "54325",
"source_url": "https://ofac.treasury.gov/specially-designated-nationals-list-data-formats-data-schemas",
"citation": "Treasury OFAC SDN entry 54325",
"entity_name": "FUTECH CO LTD",
"entity_type": "Entity",
"country": "China",
"aliases": [
"BEIJING ZHENGYUXING TECHNOLOGY CO LTD"
],
"addresses": [
"1502, Floor 12, Building 9, No 88 Courtyard, Jianguo Road, Chaoyang District, Beijing 100000, China"
],
"programs": [
"NPWMD] [IFSR"
],
"date_added": null,
"raw_data": {
"grt": "-0- ",
"title": "-0- ",
"ent_num": "54325",
"program": "NPWMD] [IFSR",
"remarks": "Additional Sanctions Information - Subject to Secondary Sanctions; Organization Established Date 04 Nov 2022; Unified Social Credit Code (USCC) 91110105MAC3H8E48T (China); Linked To: RAYAN FAN KAV ANDISH CO.",
"tonnage": "-0- ",
"sdn_name": "FUTECH CO LTD",
"sdn_type": "-0- ",
"call_sign": "-0- ",
"vess_flag": "-0- ",
"vess_type": "-0- ",
"vess_owner": "-0- "
}
}Informational only — not legal advice. Cross-list matching is name-based; verify identity with the source authority before procurement or compliance decisions.